Dong-Hwal Lee
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Electron beam lithography, Reticles, Polymethylmethacrylate, Polymers, Chemistry, Photomasks, Extreme ultraviolet lithography, Mask making, Line edge roughness

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Polymers, Silicon, Diffusion, Coating, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Polymers, Scanning electron microscopy, Transmittance, Polymerization, Manganese, Line edge roughness, Edge roughness, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Polymers, Annealing, Molecules, Interfaces, Hydrogen, Diffusion, Carbonates, Line edge roughness, Chemically amplified resists

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