Dr. Dong-Hyun Kim
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 29 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Spatial light modulators, Image quality, Photomasks, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology, Stray light, Semiconducting wafers, Stereolithography

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling, Algorithms

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Model-based design

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Optical lithography, Data modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Image processing, Electroluminescence, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Solid modeling

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, Error analysis, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling, Instrument modeling

Showing 5 of 9 publications
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