Dong-Seok Nam
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Etching, Dry etching, Chromium, Oxygen, Emission spectroscopy, Photomasks, Plasma etching, Mask making, Chlorine, Plasma

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beam lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation, Edge roughness

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Electron beam lithography, Etching, Image processing, Error analysis, Electrons, Image registration, Finite element methods, Photomasks, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Scattering, Laser scattering, Control systems, Monte Carlo methods, Photomasks, Optical proximity correction, Mask making

Showing 5 of 26 publications
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