Dong-Soo Min
Manager/R&D Ctr at Photronics Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Polishing, Etching, Particles, Ceramics, Resistance, Surface roughness, Scanning electron microscopy, Raw materials, Plasma treatment, Plasma

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Dry etching, Manufacturing, Chromium, Transmittance, Photomasks, Critical dimension metrology, Fluorine, Phase shifts

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Electrodes, Glasses, Ions, Chemistry, Chromium, Plasma etching, Chlorine, Fluorine, Plasma

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Cadmium, Etching, Dry etching, Manufacturing, Chromium, Photoresist materials, Photomasks, Plasma etching, Inductance, Plasma

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Signal to noise ratio, Etching, Dry etching, Chromium, Signal processing, Photomasks, Signal detection, Optics manufacturing, Plasma, Absorption

Showing 5 of 8 publications
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