Dr. Dong-Wook Lee
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Oxides, Deep ultraviolet, Air contamination, Scanners, Chromium, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Multilayers, Etching, Ultraviolet radiation, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Semiconducting wafers, Ruthenium

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Opacity, Printing, Solids, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Air contamination, Ultraviolet radiation, Particles, Molecules, Ions, Reflectivity, Chromium, Photomasks, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Electron beams, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology

Showing 5 of 11 publications
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