Dr. Dong-Woon Park
Principal engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Metals, Scanners, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Light sources, Manufacturing, Reliability, Image quality, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Polarization, Polarizers, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Electronics, Data modeling, Scattering, Etching, Manufacturing, Photoresist materials, Finite element methods, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Refractive index, Calibration, Scanners, Diffusion, Scanning electron microscopy, Nanoimprint lithography, Data conversion, Device simulation, Instrument modeling

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Lithography, Electron beams, Lithographic illumination, Scanners, Diffusion, Image sensors, Photomasks, Convolution, Semiconducting wafers

Showing 5 of 6 publications
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