Dr. Dong-Woon Park Profile

Dr. Dong-Woon Park

Principal Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 28 March 2017 Presentation + Paper

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Sean Park, Lei Liu, Angelique Nachtwein, Christopher Jones, Philip Yan, Vincent Hu, Jangho Shin, Ming-Chun Tien, Marinus Jochemsen, Boo-Hyun Ham, Ki-Yeop Park

Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

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Proceedings Article | 26 March 2007 Paper

A method for generating assist-features in full-chip scale and its application to contact layers of sub-70-nm DRAM devices

Han-Ku Cho, Dong-Woon Park, Joo-Tae Moon, Chan Hwang, Sangwook Kim, Sukjoo Lee

Proceedings Volume 6520, 652028 (2007) https://doi.org/10.1117/12.713055

KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Lithography, Semiconducting wafers, Light sources, Image quality, Manufacturing, Optical simulations, Reliability

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Proceedings Article | 24 March 2006 Paper

Investigation on polarization monitoring mask: pattern design and experimental verification

Joo-Tae Moon, Dong-Seok Nam, Chan Hwang, Han-Ku Cho, Suk-Joo Lee, Dong-Woon Park, Sang-Gyun Woo, Jang-Ho Shin

Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054

KEYWORDS: Polarization, Photomasks, Polarizers, Semiconducting wafers, Diffraction, Optical lithography, Lithographic illumination, Reticles, Critical dimension metrology, Printing

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Proceedings Article | 28 May 2004 Paper

Modified procedure for evaluation of low-k1 process windows

Han-Ku Cho, Sook Lee, Sang-Gyun Woo, Woo-Sung Han, Dong-Woon Park

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536338

KEYWORDS: Photomasks, Lithography, Finite element methods, Critical dimension metrology, Manufacturing, Photoresist materials, Scattering, Electronics, Data modeling, Etching

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Proceedings Article | 28 May 2004 Paper

A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Dong-Woon Park, Ho-Chul Kim, Sang-Gyun Woo, Joo-Tae Moon, Sook Lee, Han-Ku Cho, In-Sung Kim, Chan Hwang

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536280

KEYWORDS: Calibration, Lithography, Scanning electron microscopy, Data conversion, Refractive index, Device simulation, Diffusion, Scanners, Instrument modeling, Nanoimprint lithography

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Proceedings Article | 29 April 2004 Paper

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Sang-Gyun Woo, Dong-Woon Park, Chan Hwang, Woo-Sung Han, Insung Kim, Joo-Tae Moon, Han-Ku Cho, Jangho Shin

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536345

KEYWORDS: Photomasks, Diffusion, Convolution, Lithography, Lithographic illumination, Semiconductors, Image sensors, Semiconducting wafers, Scanners, Electron beams

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Showing 5 of 6 publications

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