Dr. Dong-Woon Park
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Lithography, Semiconducting wafers, Light sources, Image quality, Manufacturing, Optical simulations, Reliability

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Polarization, Photomasks, Polarizers, Semiconducting wafers, Diffraction, Optical lithography, Lithographic illumination, Reticles, Critical dimension metrology, Printing

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Photomasks, Lithography, Finite element methods, Critical dimension metrology, Manufacturing, Photoresist materials, Scattering, Electronics, Data modeling, Etching

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Calibration, Lithography, Scanning electron microscopy, Data conversion, Refractive index, Device simulation, Diffusion, Scanners, Instrument modeling, Nanoimprint lithography

Showing 5 of 6 publications
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