Dr. Donggun Lee
Sr. Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Inspection, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mirrors, Metrology, Imaging systems, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, High volume manufacturing, Semiconducting wafers, Binary data, Airborne remote sensing, EUV optics, Lead

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Speckle, Scattering, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Scatter measurement

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Etching, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Carbon, Optical lithography, Contamination, Air contamination, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Showing 5 of 12 publications
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