Dr. Donggun Lee
Sr. Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (12)

Proceedings Article | 16 October 2017 Presentation
Proceedings Volume 10451, 104510I (2017) https://doi.org/10.1117/12.2280687
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

Proceedings Article | 28 March 2017 Presentation + Paper
Jihoon Na, Donggun Lee, Changhwan Do, Hong-seok Sim, Jung-Hwan Lee, Jungyoup Kim, Hwan-Seok Seo, Heebom Kim, Chan Uk Jeon
Proceedings Volume 10145, 101450M (2017) https://doi.org/10.1117/12.2257390
KEYWORDS: Photomasks, Extreme ultraviolet, Imaging systems, Extreme ultraviolet lithography, Airborne remote sensing, Inspection, Line width roughness, High volume manufacturing, Lead, Metrology, Semiconducting wafers, Scanning electron microscopy, SRAF, Binary data, EUV optics, Mirrors

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560J (2014) https://doi.org/10.1117/12.2070303
KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

Proceedings Article | 27 May 2010 Paper
Jin-Back Park, Kyoung-Yoon Bang, Dong-Gun Lee, Hae-Young Jeong, Seung-Soo Kim, Han-Ku Cho
Proceedings Volume 7748, 77481X (2010) https://doi.org/10.1117/12.868293
KEYWORDS: Extreme ultraviolet, Photomasks, Ruthenium, Data modeling, Etching, Atomic force microscopy, EUV optics, Silicon, Scanning electron microscopy, Critical dimension metrology

Showing 5 of 12 publications
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