Dr. Donggun Lee
Sr. Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Photomasks, Extreme ultraviolet, Imaging systems, Extreme ultraviolet lithography, Airborne remote sensing, Inspection, Line width roughness, High volume manufacturing, Lead, Metrology, Semiconducting wafers, Scanning electron microscopy, SRAF, Binary data, EUV optics, Mirrors

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Extreme ultraviolet, Photomasks, Ruthenium, Data modeling, Etching, Atomic force microscopy, EUV optics, Silicon, Scanning electron microscopy, Critical dimension metrology

Showing 5 of 12 publications
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