DongYoung Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 27, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Optical imaging, Metrology, Diffractive optical elements, Etching, Optical metrology, Process control, Semiconducting wafers, Overlay metrology, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Visible radiation, Light sources, Imaging technologies, Optical testing, Signal processing, Integrated circuits, Semiconducting wafers, Electromagnetism, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Metrology, Modulation, Scanners, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Data modeling, Scanners, Inspection, Control systems, Scanning electron microscopy, Optical inspection, Process control, Semiconductor manufacturing, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Overlay metrology

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