Dr. DONGCHUL IHM
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Modulation, Manufacturing, Inspection, Optical inspection, Wafer inspection, Semiconducting wafers, Electronic design automation, Design for manufacturability

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Thin films, Multilayers, Finite-difference time-domain method, Polarization, Inspection, Reflectivity, Numerical analysis, Wafer inspection, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Defect detection, Particles, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Wafer inspection, Semiconducting wafers, Front end of line, Defect inspection

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Electronics, Metrology, Microscopy, Silicon, Inspection, Process control, High volume manufacturing, Phase measurement, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Optical filters, Metrology, Image processing, Silicon, Atomic force microscopy, Transmission electron microscopy, Process control, Photomasks, Transistors, Critical dimension metrology

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Calibration, Error analysis, Atomic force microscopy, Near field scanning optical microscopy, Humidity, Solids, Feedback loops, Critical dimension metrology, Liquids

Showing 5 of 8 publications
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