Dongjin Lee
at SK Hynix Inc
SPIE Involvement:
Publications (6)

Proceedings Article | 20 March 2020 Paper
Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee
Proceedings Volume 11325, 113252X (2020)
KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

Proceedings Article | 20 March 2020 Presentation + Paper
Alexander Verner, Hyunsok Kim, Ikhyun Jeong, Seungwoo Koo, Dongjin Lee, Honggoo Lee, Boaz Ophir, Ohad Bachar, Liran Yerushalmi, Sanghuck Jeon, Dongsub Choi, Jeongpyo Lee
Proceedings Volume 11325, 113251Z (2020)
KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Overlay metrology, Scanning electron microscopy, Optical parametric oscillators, Data modeling, Machine learning, Optical testing, Feature extraction, Metrology

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742C (2009)
KEYWORDS: Optical proximity correction, Critical dimension metrology, Metrology, Printing, Overlay metrology, Data modeling, Photomasks, Semiconductors, Systems modeling

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65201R (2007)
KEYWORDS: Optical proximity correction, Polarization, Calibration, Critical dimension metrology, Data modeling, Lithographic illumination, Resolution enhancement technologies, Lithography, Semiconducting wafers, Line edge roughness

Proceedings Article | 20 May 2006 Paper
James Moon, Dong-Jin Lee, Gui-Hwang Sim, Jae-Doo Eum, Byung-Ho Nam, Dong Gyu Yim
Proceedings Volume 6283, 62832X (2006)
KEYWORDS: Lithography, Lithographic illumination, Photomasks, Safety, Inspection, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Error analysis

Showing 5 of 6 publications
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