Dongjin Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Optical parametric oscillators, Detection and tracking algorithms, Data modeling, Feature extraction, Optical testing, Scanning electron microscopy, Machine learning, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Spatial frequencies, Etching, Scanners, Inspection, High volume manufacturing, Feedback loops, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Metrology, Data modeling, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Systems modeling, Overlay metrology

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Polarization, Calibration, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Safety, Lithographic illumination, Error analysis, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 6 publications
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