Dongjin Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Metrology, Data modeling, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Systems modeling, Overlay metrology

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Polarization, Calibration, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Safety, Lithographic illumination, Error analysis, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Etching, Particles, Coating, Inspection, Reflectivity, Transistors, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis

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