Dongkwan Lee
Global Marketing Director at EMD Performance Materials Corp.
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Carbon, Lithography, Etching, Image processing, Silicon, Coating, Fourier transforms, Oxygen, Photoresist materials, Photomasks

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Polymers, Particles, Composites, Manufacturing, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Etching, Polymers, Electroluminescence, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Manufacturing, Nomenclature, Photoresist materials, Line edge roughness, Selenium, Standards development, Information operations

Showing 5 of 6 publications
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