Dr. Donis G Flagello
President and CEO at Nikon Research Corp of America
SPIE Involvement:
| Board of Directors | Information Technology Committee | Membership & Communities Committee | Nominating Committee | Publications Committee | Strategic Planning Committee | Fellow status | Conference Program Committee | Symposium Committee | Symposium Chair | Conference Chair | Conference Co-Chair | Author | Instructor
Area of Expertise:
Photolithography , Physical Optics , Imaging , Modeling
Publications (53)

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Scanners, Ions, Manufacturing, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Detection and tracking algorithms, Image processing, Photomasks, Cadmium sulfide, Source mask optimization, Optical proximity correction, Freeform optics, Optimization (mathematics), Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Scanners, Image acquisition, Computer simulations, Near field, Finite element methods, Photomasks, Computational lithography, Fiber optic illuminators, Maxwell's equations

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Thin films, Image compression, Data modeling, Calibration, Diffusion, Photoresist materials, Finite element methods, Optical proximity correction, Statistical modeling, Photoresist developing

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Point spread functions, Reticles, Lithographic illumination, Imaging systems, Computer simulations, Ray tracing, Source mask optimization, Critical dimension metrology, Fiber optic illuminators

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Error analysis, Reliability, Near field, Photomasks, Source mask optimization, Chemical elements, Optimization (mathematics), Semiconducting wafers, Maxwell's equations

Showing 5 of 53 publications
Conference Committee Involvement (20)
Computational Optics 2018
16 May 2018 | Frankfurt, Germany
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
Computational Optics
7 September 2015 | Jena, Germany
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
Showing 5 of 20 published special sections
Course Instructor
SC706: Imaging and Optics Fundamentals in Advanced Lithography
Optical imaging in microlithography involves the physical formation of sub-micron structures within a photosensitive material for subsequent transfer into underlying films or substrates. Since the optical exposure systems used in lithography are some of the most advanced and complex optical instruments ever built, they involve ever more complex illuminator designs, nearly aberration free lenses, and hyper numerical apertures approaching unity and beyond. Fortunately, the lithography community has risen to the challenge by devising many inventive methods to characterize and optimize exposure systems. Moreover, the advanced use of simulation not only ties together characterization data to form a cohesive picture of exposure system capability, but it allows for a shorter time to development if the appropriate model calibration is successfully used. The imaging theory and models that are subsequently used in this industry, either in commercial or in-house simulation packages, have successively evolved in complexity with each new generation of the optics, but can seem very complicated to the uninitiated. This course will cover and explain the fundamentals behind imaging and optics in state-of-the-art microlithography. The basic optical concepts will be explained, including hyper-NA, polarization, and immersion optics. A systematic, step-by-step construction of partial coherent imaging models will be developed for vector and scalar assumptions. The description is enhanced by simple application examples to allow these models to be easily understood. Additional techniques are described that reduce the complexity of these models to allow for the formation of exposure tool performance prediction.
SC707A: Basics of Optical Imaging in Microlithography: A Hands-On Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
SC707: Basics of Optical Imaging in Microlithography: A Hands-on Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
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