Donna J. O'Connell
Optical Engineer at Sandia National Labs California
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Defect detection, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Data modeling, Scanners, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Point spread functions, Mirrors, Polishing, Spatial frequencies, Surface roughness, Wavefronts, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Wavefronts, Scanning electron microscopy, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Wafer-level optics, Lithography, Mirrors, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Fiber optic illuminators

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Reticles, Sensors, Xenon, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Fiber optic illuminators

Showing 5 of 17 publications
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