Doo-Youl Lee
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Scanners, Error analysis, Chromium, Image registration, Thermal effects, Photomasks, Mask making, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Scanners, Photography, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Atrial fibrillation, Cadmium, Data modeling, Scanning electron microscopy, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness, Resolution enhancement technologies

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Logic, Atrial fibrillation, Photoresist materials, Photomasks, Transistors, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness

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