Doo-Youl Lee
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Scanners, Error analysis, Chromium, Image registration, Thermal effects, Photomasks, Mask making, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Atrial fibrillation, Cadmium, Data modeling, Scanning electron microscopy, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Scanners, Photography, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Logic, Atrial fibrillation, Photoresist materials, Photomasks, Transistors, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top