Dr. Doohoon Goo
Senior Engineer at Cymer LLC
SPIE Involvement:
Publications (12)

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727142 (2009) https://doi.org/10.1117/12.813996
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Reflectivity, Scanners, Critical dimension metrology, EUV optics, Optical calibration, Cadmium

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727114 (2009) https://doi.org/10.1117/12.814001
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Photomasks, Semiconducting wafers, Scanners, Optical proximity correction, Light sources, Resistance

Proceedings Article | 4 December 2008 Paper
Chang-Min Park, Hyun-Byuk Kim, Hyung-Do Kim, Hyun-Woo Kim, Cheol-Hong Kim, Joo-On Park, Doohoon Goo, Jeongho Yeo, Seong-Woon Choi, Woo-Sung Han, Min-Su Choi, Sung-Woo Hwang
Proceedings Volume 7140, 714024 (2008) https://doi.org/10.1117/12.804627
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Double patterning technology, Lithography, Etching, Semiconductors, Control systems, Spatial resolution, Transistors

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714009 (2008) https://doi.org/10.1117/12.804673
KEYWORDS: Point spread functions, Fractal analysis, Extreme ultraviolet, Lithography, Optical proximity correction, Photomasks, Critical dimension metrology, Modulation transfer functions, Convolution, Cadmium

Proceedings Article | 12 April 2007 Paper
Proceedings Volume 6519, 65191M (2007) https://doi.org/10.1117/12.711980
KEYWORDS: Line width roughness, Polymers, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Modulation, Printing, Photoresist processing, Additive manufacturing

Showing 5 of 12 publications
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