Dr. Doohoon Goo
Senior Engineer at Cymer LLC
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, EUV optics

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Light sources, Etching, Scanners, Resistance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Etching, Control systems, Photomasks, Transistors, Double patterning technology, Spatial resolution, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Point spread functions, Cadmium, Fractal analysis, Photomasks, Extreme ultraviolet, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Modulation, Polymers, Additive manufacturing, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Optical lithography, Diffusion, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, EUV optics

Showing 5 of 12 publications
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