Dorin Cerbu
at IMEC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Image processing, Inspection, Scanning electron microscopy, Artificial neural networks, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Algorithm development, Stochastic processes, Photomask technology

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top