Dr. Douglas J. Guerrero
Senior Technologist at Brewer Science Inc
SPIE Involvement:
Conference Chair | Author | Editor
Area of Expertise:
Lithography , Underlayers , Directed self assembly , Reflection control , Photoactive polymers , Patterning processes
Websites:
Profile Summary

Douglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers.

He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several products. He is currently a Senior Technologist in the Semiconductor Materials Business Unit. He has been on assignment at imec in Leuven, Belgium since 2008 where he is developing processes for future nodes.

Dr. Guerrero is a Senior Member of SPIE and is currently chair of the SPIE Advances in Patterning Materials and Processes conference. He has served in several international symposia committees and has published over 80 papers and patents on optoelectronic materials, underlayers for lithography, reflection control, and DSA.
Publications (32)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500I (2023) https://doi.org/10.1117/12.2687546
KEYWORDS: Factor analysis, Extreme ultraviolet lithography, Surface roughness, Photoresist materials, Statistical analysis, Line width roughness, Extreme ultraviolet, Metal oxides, Lithography

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980N (2023) https://doi.org/10.1117/12.2658529
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Coating, Coating thickness, Silicon, Photoresist materials, Adhesion, Line width roughness, Resistance, Adhesives

Proceedings Article | 13 June 2022 Presentation
Jakub Koza, Caroline Evans, Runhui Huang, Jamie Storie, Vandana Krishnamurthy, Douglas Guerrero
Proceedings Volume PC12055, PC1205501 (2022) https://doi.org/10.1117/12.2628988
KEYWORDS: Carbon, System on a chip, Chemical vapor deposition, Deposition processes, Atomic layer deposition, Extreme ultraviolet lithography, Double patterning technology, Chemical mechanical planarization

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 120550A (2022) https://doi.org/10.1117/12.2610985
KEYWORDS: Extreme ultraviolet lithography, Adhesives, Polymers, Etching, Plasma etching, Optical lithography, Semiconducting wafers

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11612, 1161202 (2021) https://doi.org/10.1117/12.2592868

Showing 5 of 32 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 22 May 2023

SPIE Conference Volume | 6 July 2022

SPIE Conference Volume | 18 March 2021

Conference Committee Involvement (19)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Showing 5 of 19 Conference Committees
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