A raster multibeam lithography tool is in Etec’s roadmap to meet the stringent requirements of sub 100 nm mask fabrication. The tool leverages the long experience obtained with the ALTA laser pattern generators and the high resolution capabilities of e-beam lithography. A photocathode controlled by acousto-optic modulated 257nm laser beams is utilized to generate 32 electron beams. The beams are accelerated at 50 KV in an electron column, demagnified and focussed on the mask or wafer substrate. The performance of the photocathode and other system components will be presented together with preliminary lithographic patterning.