Dr. Douglas J. Resnick
Vice President Marketing and Business Development at Canon Nanotechnologies Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Journal Editorial Board Member | Author | Editor | Instructor
Publications (94)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanotechnology, Lithography, Optical lithography, Etching, Dry etching, Photomasks, Extreme ultraviolet lithography, Deposition processes, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Manufacturing, Photomasks, Nanoimprint lithography, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Lithography, Multilayers, Silica, Etching, Chromium, Scanning electron microscopy, Atomic layer deposition, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip, Plasma

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly

SPIE Conference Volume | April 21, 2015

SPIE Journal Paper | October 3, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

Showing 5 of 94 publications
Conference Committee Involvement (20)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Showing 5 of 20 published special sections
Course Instructor
SC622: Nano-Scale Patterning with Imprint Lithography
This course will start by discussing the basics of nanoimprint lithography including a discussion of the various kinds of imprint lithography. It will cover advantages and challenges of using imprint lithography for sub-100 nm and sub-50 nm patterning. The course will focus on step and repeat UV nanoimprint lithography tools and processes. Specific topics addressed will include: tool design and performance, process resolution limits, CD control, etch requirements, overlay alignment, process defects, materials development, and 1X mask infrastructure. Potential applications of the technology will also be discussed.
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