Dr. Duane B. Barber Profile

Dr. Duane B. Barber

Yield Engineer at Siemens EDA

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Publications (3)

Proceedings Article | 17 May 2005 Paper

Automated yield forecasting in a high product mix ASIC facility

Duane Barber, Mark Giewont, Jeff Hanson, Jun Shen

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.600079

KEYWORDS: Data modeling, Logic, Instrument modeling, Databases, Metals, Yield improvement, Semiconducting wafers, Performance modeling, Solids

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Proceedings Article | 17 December 2003 Paper

ART structures: a wafer targeting system that relaxes the mean-to-target reticle specification

Robert Muller, Mark Simmons, Duane Barber

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518159

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Metrology, Photomasks, Tolerancing, Time metrology, Logic, Cadmium sulfide, Semiconductors

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Proceedings Article | 30 June 1995 Paper

Amplifiers based on Cr-doped optical ceramics

Clifford Pollock, Duane Barber

Proceedings Volume 2481, (1995) https://doi.org/10.1117/12.212721

KEYWORDS: Crystals, Nanocrystals, Waveguides, Scattering, Optical amplifiers, Tunable lasers, Laser crystals, Nd:YAG lasers, Laser optics, Nanocomposites

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