Duane Hudgins
at ETH Zürich
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Light sources, Ions, Inspection, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma

SPIE Journal Paper | August 5, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Plasma, Vacuum ultraviolet, Tin, Gallium, Light sources, Ions, Indium, Extreme ultraviolet, Calibration, Inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Inspection, Control systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Coded apertures, Plasma, Tin, Aluminium phosphide

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Light sources, Ions, Indium, Inspection, Wafer inspection, Extreme ultraviolet, Vacuum ultraviolet, Gallium, Plasma, Tin

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