Duane Hudgins
at ETH Zürich
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet, Inspection, Light sources, Ions, EUV optics, Photomasks, Extreme ultraviolet lithography, Pellicles, Reflectivity, Plasma

SPIE Journal Paper | 5 August 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Plasma, Vacuum ultraviolet, Tin, Gallium, Light sources, Ions, Indium, Extreme ultraviolet, Calibration, Inspection

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Plasma, Inspection, Tin, Extreme ultraviolet lithography, Coded apertures, Aluminium phosphide, Light sources, Photomasks, Control systems

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Plasma, Vacuum ultraviolet, Tin, Gallium, Light sources, Indium, Inspection, Extreme ultraviolet, Ions, Wafer inspection

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