Dr. Duck-Hyung Hur
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 15, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Atrial fibrillation, Manufacturing, Computing systems, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Process engineering, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Reticles, Photomasks, Extreme ultraviolet, Dysprosium, Critical dimension metrology, Semiconducting wafers, Tolerancing, Yield improvement, Algorithms

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling, Algorithms

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top