Dr. Dusan Petranovic
at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Photomasks, Double patterning technology, Capacitance, Dielectrics, Statistical analysis, Extreme ultraviolet, Optical lithography, Visualization, Manufacturing, Image processing

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