Dusty Leonhard
at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Contamination, Scanners, Inspection, Reflectivity, Oxygen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Scanners, Particles, Reflectivity, Surface roughness, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

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