Dr. E. Timothy Goldburt Profile

Dr. E. Timothy Goldburt

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Publications (27)

PROCEEDINGS ARTICLE | May 23, 2015

Mobile, portable lightweight wireless video recording solutions for homeland security, defense, and law enforcement applications

Proc. SPIE. 9456, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security, Defense, and Law Enforcement XIV

KEYWORDS: Defense and security, Homeland security, Visualization, Imaging systems, Cameras, Sensors, Video, Video surveillance, Information security, Network security

PROCEEDINGS ARTICLE | April 16, 2008

Zero false alarm seismic detection and identification systems

Proc. SPIE. 6943, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security and Homeland Defense VII

KEYWORDS: Target detection, Roads, Seismic sensors, Detection and tracking algorithms, Sensors, Amplifiers, Signal processing, System identification, Signal detection, Environmental sensing

PROCEEDINGS ARTICLE | May 4, 2007

New seismic unattended small size module for footstep and light and heavy vehicles detection and identification

Proc. SPIE. 6562, Unattended Ground, Sea, and Air Sensor Technologies and Applications IX

KEYWORDS: Target detection, Roads, Seismic sensors, Detection and tracking algorithms, Sensors, Signal processing, Connectors, Electronic filtering, Signal detection, Plano

PROCEEDINGS ARTICLE | October 5, 2006

Field testing of new unattended small size seismic module for various target detection

Proc. SPIE. 6394, Unmanned/Unattended Sensors and Sensor Networks III

KEYWORDS: Target detection, Roads, Seismic sensors, Detection and tracking algorithms, Sensors, Manufacturing, Signal processing, Sensing systems, Signal detection, Environmental sensing

PROCEEDINGS ARTICLE | May 10, 2006

Seismic systems for unconventional target detection and identification

Proc. SPIE. 6201, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security and Homeland Defense V

KEYWORDS: Target detection, Defense and security, Visible radiation, Homeland security, Seismic sensors, Sensors, Signal processing, Sensing systems, Defense technologies, Signal detection

PROCEEDINGS ARTICLE | May 2, 2006

New seismic unattended small size module for footstep detection

Proc. SPIE. 6231, Unattended Ground, Sea, and Air Sensor Technologies and Applications VIII

KEYWORDS: Target detection, Homeland security, Seismic sensors, Detection and tracking algorithms, Sensors, Amplifiers, Data processing, Signal processing, Wireless communications, Signal detection

PROCEEDINGS ARTICLE | March 24, 2006

Defining the role of SEM metrology for advanced process control

Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX

KEYWORDS: Mathematical modeling, Electron beams, Metrology, Video, Silicon, Reliability, Scanning electron microscopy, Monte Carlo methods, Telecommunications, Process control

PROCEEDINGS ARTICLE | October 27, 2005

New sensitive seismic cable with imbedded geophones

Proc. SPIE. 5986, Unmanned/Unattended Sensors and Sensor Networks II

KEYWORDS: Homeland security, Seismic sensors, Sensors, Interference (communication), Amplifiers, Signal processing, Sensing systems, Electronic circuits, Signal detection, Information security

PROCEEDINGS ARTICLE | May 27, 2005

High performance seismic sensor requirements for military and security applications

Proc. SPIE. 5796, Unattended Ground Sensor Technologies and Applications VII

KEYWORDS: Target detection, Defense and security, Homeland security, Seismic sensors, Sensors, Manufacturing, Signal processing, Sensing systems, Defense technologies, Signal detection

PROCEEDINGS ARTICLE | May 20, 2005

Testing of new seismic sensors for footstep detection and other security applications

Proc. SPIE. 5778, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security and Homeland Defense IV

KEYWORDS: Target detection, Homeland security, Seismic sensors, Sensors, Manufacturing, Amplifiers, Sensing systems, Electronic circuits, Signal detection, Environmental sensing

PROCEEDINGS ARTICLE | May 10, 2005

Critical issues in quantifying line edge roughness

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Edge detection, Metrology, Error analysis, Magnetism, Scanning electron microscopy, Photoresist materials, Line width roughness, Transistors, Line edge roughness, Edge roughness

The problem of quantifying LER in the semiconductor industry has become critical with sub-100nm node manufacturing. However, routine methods for LER measurement to meet the needs of industry have not been reported. Even the definition for LER has not been defined unambiguously. Also, the length of the photoresist structure, on which LER is measured, has not bee standardized. Meanwhile, demands for precision in LER calculations have been put forward without accounting for the statistical nature of this parameter. In addition, the algorithms used for feature edge localization when performing LER measurements frequently have free parameters which makes LER estimation ambiguous and does not allow LER comparisons of the same feature. In particular, without taking into account the influence of signal noise in the SEM video, the LER measurements obtained will have contributions from both the measured feature and measuring tool (SEM). The manner in which this measurement is done results in LER values that exceed the true LER. Moreover, when measured objects have spect ratios exceeding three, it is not clear where along the cross-section height of the object-bottom, top, or some intermediate position-correspond to the measured values. The above issues make the interpretation of obtained results very difficult, and significantly reduces the reliability and value of LER measurement results present in the referenced literature. Nanometrology has developed a new concept for LER measurements that is free of many of the disadvantages mentioned above. It is based on the definition of LER as "a standard deviation of the factual edge position on SEM scan lines from an approximated straight line". Nanometrology's use of a patented algorithm for edge localization of 3D objects results in the measurement of the bottom CD of photoresist structures. Our algorithms do not have free parameters. These algorithms have been incorporated into a CD measurement software package called CD-LER.

PROCEEDINGS ARTICLE | November 30, 2004

Lab testing of new seismic sensor for defense and security applications

Proc. SPIE. 5611, Unmanned/Unattended Sensors and Sensor Networks

KEYWORDS: Target detection, Defense and security, Seismic sensors, Sensors, Manufacturing, Sensor performance, Sensing systems, Reconnaissance systems, Acoustics, Signal detection

PROCEEDINGS ARTICLE | September 15, 2004

New seismic sensors for footstep detection and other military applications

Proc. SPIE. 5403, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security and Homeland Defense III

KEYWORDS: Microelectromechanical systems, Oscillators, Seismic sensors, Sensors, Electrodes, Electromagnetic interference, Defense technologies, Nanocomposites, Electronic circuits, Signal detection

PROCEEDINGS ARTICLE | September 15, 2004

Current seismic sensor issues for defense and security applications

Proc. SPIE. 5403, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Security and Homeland Defense III

KEYWORDS: Target detection, Microelectromechanical systems, Defense and security, Homeland security, Seismic sensors, Sensors, Interference (communication), Defense technologies, Signal detection, Electromagnetism

PROCEEDINGS ARTICLE | September 1, 2004

Seismic signal and noise assessment for footstep detection range estimation in different environments

Proc. SPIE. 5417, Unattended/Unmanned Ground, Ocean, and Air Sensor Technologies and Applications VI

KEYWORDS: Defense and security, Signal to noise ratio, Homeland security, Seismic sensors, Sensors, Interference (communication), Sensing systems, Electronic filtering, Signal detection, Environmental sensing

PROCEEDINGS ARTICLE | May 24, 2004

Nanocal calibration and pitch recertification of a Hitachi microscale standard

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Metrology, Roads, Statistical analysis, Calibration, Error analysis, Scanning electron microscopy, Software development, Material characterization, Standards development, Precision calibration

PROCEEDINGS ARTICLE | May 24, 2004

A novel and robust method for the accurate magnification characterization and calibration of out-of-fab SEM cluster tools

Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII

KEYWORDS: Metrology, Logic, Roads, Calibration, Scanning electron microscopy, Critical dimension metrology, System integration, Material characterization, Precision calibration, Data analysis

PROCEEDINGS ARTICLE | September 22, 2003

Seismic footstep signal characterization

Proc. SPIE. 5071, Sensors, and Command, Control, Communications, and Intelligence (C3I) Technologies for Homeland Defense and Law Enforcement II

KEYWORDS: Target detection, Signal to noise ratio, Homeland security, Seismic sensors, Sensors, Interference (communication), Electronic filtering, Signal analyzers, Signal detection, Filtering (signal processing)

PROCEEDINGS ARTICLE | September 18, 2003

A novel method for footstep detection with extremely low false alarm rate

Proc. SPIE. 5090, Unattended Ground Sensor Technologies and Applications V

KEYWORDS: Homeland security, Seismic sensors, Sensors, Computing systems, Signal processing, Software development, Sensing systems, Shape analysis, Signal analyzers, Signal detection

PROCEEDINGS ARTICLE | September 18, 2003

Single- and three-axis geophone: footstep detection with bearing estimation, localization, and tracking

Proc. SPIE. 5090, Unattended Ground Sensor Technologies and Applications V

KEYWORDS: Defense and security, Roads, Homeland security, Seismic sensors, Cameras, Sensors, Error analysis, Wave propagation, Sensing systems, Signal detection

PROCEEDINGS ARTICLE | June 2, 2003

Quantifying drift in SEM

Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII

KEYWORDS: Metrology, Image processing, Image acquisition, Distortion, Image analysis, Scanning electron microscopy, Digital imaging, Software development, Chlorine, Electromagnetism

PROCEEDINGS ARTICLE | June 2, 2003

Accuracy in CD-SEM metrology

Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII

KEYWORDS: Metrology, Etching, Video, Silicon, Image analysis, Scanning electron microscopy, Photoresist materials, Smoothing, Critical dimension metrology, Algorithm development

PROCEEDINGS ARTICLE | June 2, 2003

Designing a reference for CD-SEM magnification calibration

Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII

KEYWORDS: Edge detection, Contamination, Calibration, Gallium arsenide, Silicon, Scanning electron microscopy, Precision measurement, Very large scale integration, Semiconducting wafers, Precision calibration

PROCEEDINGS ARTICLE | July 24, 2002

Scan linearity: a hidden factor in SEM magnification calibration

Proc. SPIE. 4608, Nanostructure Science, Metrology, and Technology

KEYWORDS: Signal to noise ratio, Metrology, Roads, Calibration, Electron microscopes, Distortion, Scanning electron microscopy, Precision measurement, Critical dimension metrology, Data corrections

PROCEEDINGS ARTICLE | July 16, 2002

Matching and monitoring a CD-SEM tool cluster

Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI

KEYWORDS: Signal to noise ratio, Metrology, Calibration, Silicon, Scanning electron microscopy, Precision measurement, Critical dimension metrology, Semiconducting wafers, Nanolithography, Precision calibration

PROCEEDINGS ARTICLE | July 16, 2002

Factors influencing CD-SEM metrology

Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI

KEYWORDS: Signal to noise ratio, Metrology, Calibration, Video, Scanning electron microscopy, Digital imaging, Signal processing, Convolution, Semiconducting wafers, Precision calibration

PROCEEDINGS ARTICLE | April 12, 1999

Highly efficient phosphors and phospher screens for FED displays

Proc. SPIE. 3636, Flat Panel Display Technology and Display Metrology

KEYWORDS: Plasmons, Electron beams, Light emitting diodes, Luminescence, Ions, Flat panel displays, LED displays, Field emission displays, Spherical lenses, RGB color model

Showing 5 of 27 publications

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