Prof. Eberhard Manske
Head of Dept of Precision Measurement Technology at Technische Univ Ilmenau
SPIE Involvement:
Conference Program Committee | Author
Websites:
Publications (55)

Proceedings Article | 7 April 2024 Poster
Johannes Belkner, Jaqueline Stauffenberg, Guido Straube, Ingo Ortlepp, Thomas Kissinger, Eberhard Manske
Proceedings Volume 12997, 129971I (2024) https://doi.org/10.1117/12.3022472
KEYWORDS: Confocal microscopy, Microspheres, Multiphoton lithography, Manufacturing, Photonic nanostructures, Signal to noise ratio, Signal detection, Photonic microstructures, Modeling, Lithium

Proceedings Article | 4 October 2023 Presentation + Paper
Proceedings Volume 12672, 1267205 (2023) https://doi.org/10.1117/12.2675734
KEYWORDS: Optical surfaces, Reconstruction algorithms, Mirrors, Motion measurement, Metrology, Matrices, Simulations, Optical spheres, Measurement uncertainty

Proceedings Article | 3 October 2023 Presentation + Paper
Annika-Verena Häcker, Jaqueline Stauffenberg, Eberhard Manske
Proceedings Volume 12653, 126530A (2023) https://doi.org/10.1117/12.2677297
KEYWORDS: Multiphoton lithography, Light sources and illumination, Voxels, Laser systems engineering, Sensors, Reflection, Objectives, Bragg cells, Nanofabrication, Mirrors

Proceedings Article | 15 August 2023 Presentation + Paper
Johannes Belkner, Jaqueline Stauffenberg, Christian Görner Tenorio, Ingo Ortlepp, Eberhard Manske
Proceedings Volume 12618, 126180R (2023) https://doi.org/10.1117/12.2673874
KEYWORDS: Confocal microscopy, Modulation, Microscopes, Interferometers, Manufacturing, Lithography, Aspheric lenses, Signal detection, Field programmable gate arrays, Optical metrology, 3D profilers

Proceedings Article | 30 April 2023 Presentation
Eberhard Manske, Ivo Rangelow, Jaqueline Stauffenberg, Thomas Kissinger, Ingo Ortlepp, Thomas Fröhlich, Denis Dontsov, Alexander Reum
Proceedings Volume PC12497, PC124970A (2023) https://doi.org/10.1117/12.2658705
KEYWORDS: Nanolithography, Semiconducting wafers, Semiconductors, Scanning probe lithography, Optical resolution, Optical lithography, Nanotechnology, Nanofabrication, Lithography, Interferometry

Showing 5 of 55 publications
Conference Committee Involvement (8)
Optics and Photonics for Advanced Dimensional Metrology III
9 April 2024 | Strasbourg, France
Optical Measurement Systems for Industrial Inspection XIII
26 June 2023 | Munich, Germany
Optical Measurement Systems for Industrial Inspection XII
21 June 2021 | Online Only, Germany
Optical Measurement Systems for Industrial Inspection XI
24 June 2019 | Munich, Germany
Optical Measurement Systems for Industrial Inspection X
26 June 2017 | Munich, Germany
Showing 5 of 8 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top