Dr. Ebo H. Croffie
at Synopsys Inc
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Calibration, 3D modeling, Optical testing, Photomasks, Source mask optimization, Optical proximity correction, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, 3D modeling, Photomasks, Optical proximity correction, Statistical modeling, Performance modeling, 3D image processing

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing, Process modeling

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Metals, Finite element methods, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Diffraction, Mirrors, Calibration, Spatial light modulators, Photomasks, Transistors, Optical proximity correction, Maskless lithography, Optimization (mathematics), Semiconducting wafers

Showing 5 of 25 publications
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