Dr. Ebo H. Croffie
at Synopsys Inc
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 26 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Calibration, 3D modeling, Optical testing, Photomasks, Source mask optimization, Optical proximity correction, Performance modeling, Process modeling

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, 3D modeling, Photomasks, Optical proximity correction, Statistical modeling, Performance modeling, 3D image processing

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing, Process modeling

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Metals, Finite element methods, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

Showing 5 of 25 publications
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