Dr. Edita Tejnil
Product Engineer at Mentor Graphics Corp
SPIE Involvement:
Senior status | Author
Publications (33)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Optical properties, Calibration, 3D modeling, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Optical calibration, Process modeling

SPIE Journal Paper | February 16, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Data transmission, 3D modeling, Image quality, Near field, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

SPIE Journal Paper | December 2, 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

PROCEEDINGS ARTICLE | September 10, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 33 publications
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