Dr. Edita Tejnil
Principal Product Engineer at Mentor a Siemens Business
SPIE Involvement:
Conference Program Committee | Author
Publications (33)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Optical properties, Calibration, 3D modeling, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Optical calibration, Process modeling

SPIE Journal Paper | 16 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Data transmission, 3D modeling, Image quality, Near field, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

Showing 5 of 33 publications
Conference Committee Involvement (4)
Optical Lithography XXXIV
21 February 2021 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
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