Edward Ehrlacher
at Lucent Technologies
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Data modeling, Deep ultraviolet, Calibration, Diffusion, Distortion, Solids, Optical proximity correction, Convolution, Photoresist processing, Process modeling

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Reticles, Lithographic illumination, Matrices, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology

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