Edward Lauder
at Intel Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Etching, Diffractive optical elements, Semiconducting wafers, Reticles, Phase modulation, Optical proximity correction, Manufacturing

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