Dr. E. Kirk Miller
Applications Scientist
SPIE Involvement:
Publications (18)

Proceedings Article | 10 September 2014 Paper
B. Beeman, A. Carpenter, J. Kimbrough, T. Clancy, R. Chow, E. Bond, Z. Zayas-Rivera, P. Bell, J. Celeste, A. MacPhee, W. Widmann, T. Golod, E. Miller, R. Abbott, K. Lee, J. Peterson, S. Gordoni, J. Buckley, W. Donaldson
Proceedings Volume 9211, 92110E (2014) https://doi.org/10.1117/12.2063836
KEYWORDS: National Ignition Facility, Diagnostics, Semiconductor lasers, X-rays, Polarization, Fiber lasers, Servomechanisms, Sensors, X-ray detectors, Optical amplifiers

Proceedings Article | 15 October 2012 Paper
B. Beeman, A. MacPhee, J. Kimbrough, G. Lacaille, M. Barrios, J. Emig, J. Hunter, E. Miller, W. Donaldson
Proceedings Volume 8505, 850507 (2012) https://doi.org/10.1117/12.931436
KEYWORDS: Comets, Signal detection, National Ignition Facility, Diagnostics, Signal to noise ratio, Multiplexing, Modulators, Pulsed laser operation, Interference (communication), X-rays

Proceedings Article | 9 September 2010 Paper
Robert Malone, Zaheer Ali, Brian Cox, Scott Evans, Brent Frogget, Hans Herrmann, Morris Kaufman, Yong Kim, Kevin McGillivray, Joseph Mack, E. Kirk Miller, Martin Palagi, Wolfgang Stoeffl, Aric Tibbitts, Thomas Tunnell, Carl Young
Proceedings Volume 7652, 76520Z (2010) https://doi.org/10.1117/12.869102
KEYWORDS: Sensors, National Ignition Facility, Mirrors, Fusion energy, Diagnostics, Optical fibers, Relays, Atmospheric Cherenkov telescopes, Tungsten, X-rays

Proceedings Article | 20 August 2004 Paper
Kirk Miller, Katsuhiro Matsuyama, Ingo Schmitz, Dean Dawson
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557810
KEYWORDS: Optical proximity correction, Etching, 3D metrology, Metrology, Atomic force microscopy, Photomasks, Logic, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 24 May 2004 Paper
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534104
KEYWORDS: Semiconducting wafers, Silicon, Atomic force microscopy, Critical dimension metrology, Metrology, Etching, 3D metrology, Deconvolution, Lithography, Photomasks

Showing 5 of 18 publications
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