Dr. E. Kirk Miller
Applications Scientist at
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | September 10, 2014
Proc. SPIE. 9211, Target Diagnostics Physics and Engineering for Inertial Confinement Fusion III
KEYWORDS: Optical amplifiers, Polarization, Sensors, X-rays, Diagnostics, Fiber lasers, Semiconductor lasers, Servomechanisms, X-ray detectors, National Ignition Facility

PROCEEDINGS ARTICLE | October 15, 2012
Proc. SPIE. 8505, Target Diagnostics Physics and Engineering for Inertial Confinement Fusion
KEYWORDS: Signal to noise ratio, X-rays, Diagnostics, Interference (communication), Multiplexing, Modulators, Signal detection, Pulsed laser operation, National Ignition Facility, Comets

PROCEEDINGS ARTICLE | September 9, 2010
Proc. SPIE. 7652, International Optical Design Conference 2010
KEYWORDS: Optical fibers, Mirrors, Sensors, X-rays, Tungsten, Diagnostics, Relays, National Ignition Facility, Atmospheric Cherenkov telescopes, Fusion energy

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Metrology, Logic, Etching, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Metrology, Etching, Silicon, Atomic force microscopy, 3D metrology, Deconvolution, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Metrology, Logic, Etching, Silicon, Atomic force microscopy, 3D metrology, Critical dimension metrology, Algorithm development, Semiconducting wafers

Showing 5 of 18 publications
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