Dr. Edward Ng Profile

Dr. Edward Ng

at EMD Electronics

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 25 March 2016 Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jian Yin, Jihoon Kim, Yi Cao, Jin Li, SungEun Hong, Durairaj Baskaran, Guanyang Lin

Proceedings Volume 9779, 977914 (2016) https://doi.org/10.1117/12.2220424

KEYWORDS: Directed self assembly, Semiconducting wafers, Scanning electron microscopy, Etching, Silicon, Optical lithography, Polymers, Line edge roughness, Photomicroscopy, Annealing

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Novel spin-on metal hardmask materials for filling applications

Alberto Dioses, Venkata Chada, Elizabeth Wolfer, Edward Ng, Salem Mullen, Huirong Yao, JoonYeon Cho, Munirathna Padmanaban

Proceedings Volume 9051, 90512B (2014) https://doi.org/10.1117/12.2046676

KEYWORDS: Etching, Resistance, Metals, Chemical vapor deposition, Semiconducting wafers, Silicon, Wet etching, Atomic layer deposition, Oxides, Semiconductor manufacturing

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Proceedings Article | 31 March 2010 Paper

Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7639, 763928 (2010) https://doi.org/10.1117/12.846313

KEYWORDS: Fourier transforms, Lithography, Silicon, Plasma etching, Plasma, Coating, Polymers, Bottom antireflective coatings, Etching, 193nm lithography

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Proceedings Article | 11 December 2009 Paper

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Shinji Miyazaki, Yuki Ubayashi, Kazuma Yamamoto, Yasushi Akiyama, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7520, 75200N (2009) https://doi.org/10.1117/12.837050

KEYWORDS: Fourier transforms, Polymers, Lithography, Bottom antireflective coatings, Plasma etching, Plasma, Etching, Silicon, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 1 April 2009 Paper

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Takanori Kudo, Meng Li, Lin Zhang, Sumathy Vasanthan, Srinivasan Chakrapani, Deepa Parthasarathy, Charito Antonio, Edward Ng, Ping-Hung Lu, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7273, 727316 (2009) https://doi.org/10.1117/12.816375

KEYWORDS: Prototyping, Polymers, Binary data, Fourier transforms, Bottom antireflective coatings, Arsenic, Plasma etching, Head-mounted displays, Electroluminescence, Coating

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Proceedings Article | 26 March 2008 Paper

Development of thick negative photoresists for electroplating applications

Chunwei Chen, Robert Plass, Edward Ng, Sam Lee, Stephen Meyer, Georg Pawlowski, Rozalia Beica

Proceedings Volume 6923, 69233E (2008) https://doi.org/10.1117/12.773986

KEYWORDS: Photoresist materials, Electroplating, Copper, Lithography, Semiconducting wafers, Photoresist developing, Solids, Plating, Gold, Thin film coatings

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Showing 5 of 7 publications

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