Dr. Edward K. Pavelchek
at Dow Electronic Materials
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | September 14, 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Argon, Chromium, Photoresist materials, Photomasks, Nanoimprint lithography, Critical dimension metrology, Binary data

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Oxides, Lithography, Etching, Argon, Error analysis, Dielectrics, Coating, Thin film coatings, Semiconducting wafers, Prototyping

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Data modeling, Diffusion, Inspection, Photoresist materials, Promethium, Photoresist processing, Process modeling, Standards development, Picture Archiving and Communication System

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Data modeling, Polymers, Scanners, Diffusion, Photoresist materials, Photoresist processing, Semiconducting wafers, Standards development, Chemically amplified resists

PROCEEDINGS ARTICLE | April 26, 2001
Proc. SPIE. 4404, Lithography for Semiconductor Manufacturing II
KEYWORDS: Reticles, Phase shifting, Argon, Manufacturing, Electroluminescence, Photomasks, Picosecond phenomena, Autoregressive models, Binary data, Thermal modeling

PROCEEDINGS ARTICLE | August 23, 2000
Proc. SPIE. 4182, Process Control and Diagnostics
KEYWORDS: Thin films, Refractive index, Antireflective coatings, Optical properties, Silicon, Reflectivity, Photoresist materials, Reflectometry, Semiconducting wafers, Spectral models

Showing 5 of 21 publications
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