Dr. Edward K. Pavelchek
at DuPont Electronics & Industrial
SPIE Involvement:
Publications (21)

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435786
KEYWORDS: Photomasks, Binary data, Nanoimprint lithography, Critical dimension metrology, Photoresist materials, Deep ultraviolet, Argon, Chromium, Lithography, Reticles

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436818
KEYWORDS: Standards development, Diffusion, Polymers, Lithography, Data modeling, Photoresist materials, Semiconducting wafers, Scanners, Chemically amplified resists, Photoresist processing

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436815
KEYWORDS: Lithography, Standards development, Data modeling, Promethium, Photoresist materials, Photoresist processing, Diffusion, Inspection, Process modeling, Picture Archiving and Communication System

Proceedings Article | 24 August 2001 Paper
Edward Pavelchek, Marjorie Cernigliaro, Peter Trefonas, Amy Kwok, Suzanne Coley
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436920
KEYWORDS: Semiconducting wafers, Etching, Dielectrics, Oxides, Coating, Error analysis, Argon, Prototyping, Thin film coatings, Lithography

Proceedings Article | 26 April 2001 Paper
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425204
KEYWORDS: Binary data, Photomasks, Picosecond phenomena, Electroluminescence, Manufacturing, Autoregressive models, Argon, Phase shifting, Reticles, Thermal modeling

Showing 5 of 21 publications
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