Dr. Edward Rutter
Senior Principal Process Engineer at Finisar Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 18, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Thin films, Interfaces, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness, Photoresist processing, 3D image processing, Liquids

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical lithography, Etching, Silicon, Chemistry, Reflectivity, Photoresist materials, Wet etching, Plasma etching, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Transparency, Etching, Polymers, Diffusion, Resistance, Absorbance, Critical dimension metrology, Standards development, Quenching (fluorescence)

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