Dr. Eelco van Setten
Principal architect EUV Imaging at ASML Netherlands B.V.
SPIE Involvement:
Author
Publications (54)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Scanners, Image resolution, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Polarization, Sensors, Scanners, Lens design, Extreme ultraviolet lithography, High volume manufacturing, Polarization control

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10694, Computational Optics II
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Imaging systems, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Modeling, Lithography, Imaging systems, Sensors, Scanners, Manufacturing, Lens design, Photomasks, Extreme ultraviolet lithography, Optical proximity correction

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics

Showing 5 of 54 publications
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