Eelco van Setten
Principal architect EUV Imaging at ASML Netherlands BV
SPIE Involvement:
Author
Publications (67)

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Deep ultraviolet, Scanners, Manufacturing, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Scanners, Manufacturing, Reflectivity, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Optical lithography, Sensors, Scanners, Lens design, Buildings, Printing, Projection systems, Extreme ultraviolet lithography, High volume manufacturing, Device simulation

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Diffraction, Multilayers, Optical lithography, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Molybdenum, Optimization (mathematics)

Showing 5 of 67 publications
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