Efrat Noifeld
at Applied Materials Israel, Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 8 April 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Mathematical modeling, Metrology, Optical lithography, Detection and tracking algorithms, Scanning electron microscopy, Process control, Image enhancement, Computer aided design, Critical dimension metrology, Algorithm development

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