Eiichi Kawamura
Manager at Fujitsu Labs
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Databases, Scanners, Control systems, Data processing, Telecommunications, Process control, Photomasks, Data backup, Back end of line

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Reticles, Databases, Error analysis, Control systems, Process control, Critical dimension metrology, Semiconducting wafers, Antimony, Overlay metrology

Proceedings Article | 17 May 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Semiconductors, Data mining, Lithography, Statistical analysis, Manufacturing, Inspection, Control systems, Process control, Mining, Data analysis

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Metrology, Metals, Tungsten, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Molybdenum, Photoresist processing

Showing 5 of 6 publications
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