Mr. Eiichi Soda
Researcher at Semiconductor Leading Edge Technologies Inc.
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Semiconductors, Metals, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Anisotropy

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Etching, Silicon, Manufacturing, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, System on a chip, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Electron beam lithography, Refractive index, FT-IR spectroscopy, Optical properties, Etching, Polymers, Silicon, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beam lithography, Etching, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis, Back end of line

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Metals, Scanners, Copper, Resistance, Scanning electron microscopy, Transmission electron microscopy, Overlay metrology, Chemical mechanical planarization

Showing 5 of 6 publications
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