Mr. Eiji Kurose
at SELETE
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Optical lithography, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Electroluminescence, Laser irradiation, Image transmission, Transmittance, Photomasks, Optical simulations, Nanoimprint lithography, Phase shifts

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Monochromatic aberrations, Silicon, Transmittance, Photomasks, Optical simulations, Optical proximity correction, Reactive ion etching, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Image resolution, Electroluminescence, Image transmission, Transmittance, Photomasks, Optical simulations, Binary data, Resolution enhancement technologies, Phase shifts

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