Eiji Yamanaka
at Toshiba Corp
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 19 April 2019
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanostructures, Diffraction, Scattering, Quartz, X-rays, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Nanoimprint lithography, X-ray detectors

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Etching, X-rays, Image quality, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 18 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Nanostructures, Diffraction, Scattering, Quartz, X-rays, Nondestructive evaluation, Transmission electron microscopy, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 19 publications
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