Dr. Eileen Clifford
Adjunct Professor
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Metrology, Statistical analysis, Error analysis, Manufacturing, Optical testing, Absorbance, Analytical research, Mass attenuation coefficient, Semiconducting wafers, Tolerancing

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