Dr. Eitan Shalom
Lithography Group Leader at Tower Semiconductor Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Interfaces, Inspection, Scanning electron microscopy, Optical proximity correction, Head-mounted displays, Photoresist processing, Semiconducting wafers, Standards development, Chemically amplified resists

PROCEEDINGS ARTICLE | August 13, 1993
Proc. SPIE. 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine
KEYWORDS: Lithography, Image processing, Skin, Diffusion, Reflectivity, Scanning electron microscopy, Optical engineering, Critical dimension metrology, Photoresist processing, Absorption

PROCEEDINGS ARTICLE | June 1, 1990
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Cadmium, Image processing, Remote sensing, Reflectivity, Photoresist materials, Process control, Dysprosium, Photoresist developing, Picture Archiving and Communication System, Absorption

PROCEEDINGS ARTICLE | June 1, 1990
Proc. SPIE. 1262, Advances in Resist Technology and Processing VII
KEYWORDS: Optical imaging, Etching, Polymers, Resistance, Photoresist materials, Plasma etching, Photoresist developing, Plasma, Picture Archiving and Communication System, Absorption

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top