Dr. Elio Giuseppe De Chiara
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Laser applications, Distortion, Laser stabilization, Optical simulations, Immersion lithography, Critical dimension metrology, Overlay metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Thin films, Lithography, Reticles, Statistical analysis, Scanners, Critical dimension metrology, Semiconducting wafers, Thin film devices, 193nm lithography

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scanners, Wavefronts, Distortion, Semiconducting wafers, Yield improvement, Overlay metrology, Device simulation

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

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